The development of a fabrication process for passive photonic crystal devices in InP / InGaAsP
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Author
Date
2008Type
- Doctoral Thesis
ETH Bibliography
yes
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Permanent link
https://doi.org/10.3929/ethz-a-005753577Publication status
publishedExternal links
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Publisher
ETHSubject
PHOTONISCHE KRISTALLE; OPTISCHE MATERIALIEN; HALBLEITER + HALBLEITERTECHNOLOGIE (ELEKTROTECHNIK); TROCKENÄTZEN (MIKROELEKTRONIK); PRODUKTIONSTECHNIK; PHOTONIC CRYSTALS; OPTICAL MATERIALS; SEMICONDUCTORS + SEMICONDUCTOR TECHNOLOGY (ELECTRICAL ENGINEERING); DRY ETCHING (MICROELECTRONICS); PRODUCTION ENGINEERINGOrganisational unit
03386 - Jäckel, Heinz
Notes
Diss., Technische Wissenschaften, Eidgenössische Technische Hochschule ETH Zürich, Nr. 18062, 2008.More
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ETH Bibliography
yes
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