Abstract
In this paper, material properties of low pressure, metallic mode Coherent TiN and poison mode Coherent TiN have been examined. The material properties include resistivity, crystal orientation, stress, lattice spacing, density, texture, atomic composition, bonding, roughness, hydrogen content, and grain size. Various analytical tools have been used to analyze the TiN films.
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K. Ngan, R. Mosely, Z. Xu, and I. Raaijmakers; Proceedings of the 1994 MRS Spring Meeting; Vol 337, P249; (Material Research Society, Pittsburgh, PA, 1994).
K. Ngan, R. Mosely, Z. Xu, and I. Raaijmakers; International Conference on Metallurgical Coatings and Thin Films, April 1994, San Diego, CA 1994.
K. Ngan, R. Mosely, Z. Xu, and I. Raaijmakers; Proceedings of the 1994 VMIC Conference; P452 (IEEE, New York, 1994]
I. Raaijmakers, et al; Mater. Res. Soc. Spring Meeting, San Francisco, CA 1992; (Material Research Society, Pittsburgh, PA, 1992).
J. Nulman, K. Ngan, R. Mosely, H. Suzuki, F. Yanagawa, A. Tepman, X. Guo, and Z. Xu, Proceedings 2nd Int’l Symp. on ISSP’93 Tokyo; (1993).
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Ngan, K. Material Properties of Coherent Tin Films. MRS Online Proceedings Library 391, 217 (1995). https://doi.org/10.1557/PROC-391-217
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DOI: https://doi.org/10.1557/PROC-391-217