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Nanopatterning with UV Optical Lithography

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Abstract

Optical lithography at ultraviolet (UV) wavelengths is the standard process for patterning 90-nm state-of-the-art devices in the semiconductor industry, and extensions to 45 nm and below are currently being explored. With such high resolution, the inherent high throughput of optical lithography will enable the development of a broad range of applications beyond semiconductor electronics. In this article, we will review progress toward nanopatterning with UV light in a variety of materials and geometries.The common thread is the use of short wavelengths, 193 nm or 157 nm, coupled with immersion to further reduce the effective wavelength. Densely spaced, 32-nm (and even smaller) features have been patterned, facilitating the future preparation of large-area, deeply scaled microelectronics, nanophotonics, nanobiology, and molecular-scale self-assembly.

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Authors
  1. M. Rothschild
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  2. T. M. Bloomstein
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  3. N. Efremow Jr.
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  4. T. H. Fedynyshyn
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  5. M. Fritze
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  6. I. Pottebaum
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  7. M. Switkes
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Rothschild, M., Bloomstein, T.M., Efremow, N. et al. Nanopatterning with UV Optical Lithography. MRS Bulletin 30, 942–946 (2005). https://doi.org/10.1557/mrs2005.247

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