Abstract
A series of copper phthalocyanine thin films were prepared on amorphous substrates using physical vapor deposition at ambient temperature. Different sample preparation conditions were used: the deposition rate was varied, and the substrates was static or rotating. The preferred orientation in the thin film was studied as a function of the deposition conditions. X-ray diffraction analysis was performed using θ/2θ and pole figure measurements. In the case of layers prepared at low deposition rates and using nonrotating substrates, a very strong fiber texture was detected with (100) crystallographic planes oriented preferably parallel to the substrate surface. At higher deposition rates, an additional second type of preferred orientation was observed with (110) planes oriented preferably parallel to the substrate surface. In the case of layers prepared with rotational substrates, the (110) type of preferred orientation was quantitatively more strongly developed. If we consider electronic band structure calculations, these results imply that the electron/hole transport through the thin films is enhanced for films prepared at high deposition rates and rotating substrates.
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References
J. Simon and J-J. André, Molecular Semiconductors (SpringerVerlag, Berlin, Germany, 1985), p. 73.
Phthalocyanines, edited by C.C. Leznoff and A.B.P. Lever (VCH Publishers, Weinheim, Germany, 1989–1996), Vols. 1–4.
P. Haisch, G. Winter, M. Hanack, L. Lüer, H-J. Egelhaaf, and D. Oelkrug, Adv. Mater. 9, 316 (1997).
D. Gu, Q. Chen, X. Tang, F. Gan, S. Shen, K. Liu, and H. Xu, Opt. Commun. 121, 125 (1995).
K. Kudo, T. Sumimoto, K. Hiraga, S. Kuniyoshi, and K. Tanaka, Jpn. J. Appl. Phys. 36, 6994 (1997).
R. Rella, A. Serra, P. Siciliano, A. Tepore, L. Valli, and A. Zocco, Langmuir 13, 6562 (1997).
D. Wöhrle, L. Kreienhoop, and D. Schlettwein, in Phthalocyanines, edited by C.C. Leznoff and A.B.P. Lever (VCH Publishers, Weinheim, Germany, 1996), Vol. 4, p. 219.
S.A. Van Slyke, C.H. Chen, and C.W. Tang, Appl. Phys. Lett. 69, 2160 (1996).
G. Parthasarathy, P.E. Burrows, V. Khalfin, V.G. Kozlov, and S.R. Forrest, Appl. Phys. Lett. 72, 2138 (1998).
M. Ashida, Bull. Chem. Soc. Jpn. 39, 2625 (1966).
J.C. Buchholz and G.A. Somorjai, J. Chem. Phys. 66, 573 (1977).
W. Mizutani, M. Shigeno, Y. Sakakibara, K. Kajimura, M. Ono, S. Tanishima, K. Ohno, and N. Toshima, J. Vac. Sci. Technol. A 8, 675 (1990).
S.R. Forrest, P.E. Burrows, E.I. Haskal, and F.F. So, Phys. Rev. B 49, 11 309 (1994).
C.D. England, G.E. Collins, T.J. Schuerlein, and N.R. Armstrong, Langmuir 10, 2748 (1994).
K. Hayashi, S. Kawato, Y. Fuji, T. Horiuchi, and K. Matsushige, Mol. Cryst. Liq. Cryst. 294, 103 (1997).
M. Watanabe, K. Sano, M. Inoue, T. Takagi, T. Nakao, K. Yokota, and J. Takada. Appl. Surf. Sci. 130–132, 663 (1998).
E. Ina, N. Matsumoto, E. Shikada, and F. Kannari, Appl. Surf. Sci. 127–129, 574 (1998).
P.S. Vincett, Z.D. Popovic, and L. McIntyre, Thin Solid Films 82, 357 (1981).
M. Komiyama, Y. Sakakibara, and H. Hirai, Thin Solid Films 151, L109 (1987).
S. Tanishima, K. Ohno, Y. Sakakibara, and N. Toshima, Chem. Exp. 5, 153 (1990).
M.K. Debe, R.J. Poirier, and K.K. Kam, Thin Solid Films 197, 335 (1991).
E.A. Silinsh, and V. Capek, Organic Molecular Crystals (AIP Press, New York, 1994), p. 15.
P. Erk, in Proc. 17th Eur. Cryst. Meeting, 24–28 Aug 1997, Lisbon, Portugal.
C.J. Brown, J. Chem. Soc. A 2488 (1968).
F. Iwatsu, J. Phys. Chem. 92, 1678 (1988).
H. Yanagi and S. Okamoto, Appl. Phys. Lett. 71, 2563 (1997).
R. Resel, N. Koch, F. Meghdadi, G. Leising, W. Unzog, and K. Reichmann, Thin Solid Films 305, 232 (1997).
A. Niko, F. Meghdadi, C. Ambrosch-Draxl, P. Vogl, and G. Leising, Synth. Met. 76, 177 (1996).
K. Reichmann, N. Koch, R. Resel, F. Meghdadi, and G. Leising, Proc. MIDEM 97, 249 (1997).
R. Resel, W. Graupner, C. Hochfilzer, N. Koch, F. Meghdadi, S. Tasch, M. Wohlgenannt, G. Leising, and K. Reichmann, in Proc. XVII. Int. Conf. Appl. Crystallogr. (World Scientific, Singapore, 1998), p. 413.
W.P. Hu, Y.Q. Liu, S.Q. Zhu, J. Tao, D.F. Xu, and D.B. Zhu, Thin Solid Films 347, 299 (1999).
T. Nagasawa, K. Murakami, and K. Watanabe, Denki-Kagaku 66, 1034 (1998).
H.K. Pulker, in Coatings on Glass, Thin Films and Technology 6, edited by G. Siddall (Elsevier Science, New York, 1984).
W. Kraus and G. Nolze, J. Appl. Crystallogr. 29, 301 (1996).
S. Weber, J. Appl. Crystallogr. 29, 306 (1996).
C.J. Brown, J. Chem. Soc. A 2494 (1968).
S.R. Forrest, M.L. Kaplan, and P.H. Schmid, J. Appl. Phys. 56, 543 (1984).
H-J. Brandt, R. Resel, J. Keckes, B. Koppelhuber-Bitschnau, N. Koch, and G. Leising, in Organic Nonlinear Optical Materials and Devices, edited by B. Kippelen, H.S. Lackritz, and R.O. Claus (Mater. Res. Soc. Symp. Proc. 561, Warrendale, PA, 1999), p. 161.
S. Ambily and C.S. Menon, Ind. J. Pure Appl. Phys. 34, 933 (1996).
I. Chen, J. Chem. Phys. 51, 3241 (1969).
L. Guo, D.E. Ellis, K.C. Mundim, and B.M. Hoffman, J. Porphyrins Phthalocyanines 3, 196 (1999).
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Resel, R., Ottmar, M., Hanack, M. et al. Preferred orientation of copper phthalocyanine thin films evaporated on amorphous substrates. Journal of Materials Research 15, 934–939 (2000). https://doi.org/10.1557/JMR.2000.0133
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DOI: https://doi.org/10.1557/JMR.2000.0133