Abstract
Crystallographic structures of sputtered Fe and GdFe films both with and without substrate bias voltage were investigated using an X-ray diffractometer. Films sputtered from lower Gd composition target show the crystalline phase. It was found that (110) orientation of bcc Fe in the films was improved by the small amount of incorporated Gd atoms with the existence of substrate bias voltage. Films possessing magnetization aligned perpendicular to the film plane were obtained with the application of -200 V and -300 V bias voltage to the substrate.