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Cure depth control for complex 3D microstructure fabrication in dynamic mask projection microstereolithography

Jae‐Won Choi (W.M. Keck Center for 3D Innovation, The University of Texas at El Paso, El Paso, Texas, USA)
Ryan B. Wicker (W.M. Keck Center for 3D Innovation, The University of Texas at El Paso, El Paso, Texas, USA)
Seok‐Hyun Cho (School of Mechanical Engineering, Pusan National University, Busan, South Korea)
Chang‐Sik Ha (Department of Polymer Science and Engineering, Pusan National University, Busan, South Korea)
Seok‐Hee Lee (School of Mechanical Engineering, Pusan National University, Busan, South Korea)

Rapid Prototyping Journal

ISSN: 1355-2546

Article publication date: 16 January 2009

3242

Abstract

Purpose

The paper's aim is to explore a method using light absorption for improving manufacturing of complex, three‐dimensional (3D) micro‐parts with a previously developed dynamic mask projection microstereolithography (MSL) system. A common issue with stereolithography systems and especially important in MSL is uncontrolled penetration of the ultraviolet light source into the photocrosslinkable resin when fabricating down‐facing surfaces. To accurately fabricate complex 3D parts with down‐facing surfaces, a chemical light absorber, Tinuvin 327™ was mixed in different concentrations into an acrylate‐based photocurable resin, and the solutions were tested for cure depths and successful micro‐part fabrication.

Design/methodology/approach

Tinuvin 327 was selected as the light absorber based on its high absorption characteristics (∼0.4) at 365 nm (the filtered light wavelength used in the MSL system). Four concentrations of Tinuvin 327 in resin were used (0.00, 0.05, 0.10, and 0.15 percent (w/w)), and cure depth experiments were performed. To investigate the effects of different concentrations of Tinuvin 327 on complex 3D microstructure fabrication, several microstructures with overhanging features such as a fan and spring were fabricated.

Findings

Results showed that higher concentrations of Tinuvin 327 reduced penetration depths and thus cure depths. For the resin with 0.15 percent (w/w) of the Tinuvin 327, a cure depth of ∼30 μm was achieved as compared to ∼200 μm without the light absorber. The four resin solutions were used to fabricate complex 3D microstructures, and different concentrations of Tinuvin 327 at a given irradiance and exposure energy were required for successful fabrication depending on the geometry of the micro‐part (concentrations of 0.05 and 0.1 percent (w/w) provided the most accurate builds for the fan and spring, respectively).

Research limitations/implications

Although two different concentrations of light absorber in solution were required to demonstrate successful fabrication for two different micro‐part geometries (a fan and spring), the experiments were performed using a single irradiance and exposure energy. A single solution with the light absorber could have possibly been used to fabricate these micro‐parts by varying irradiance and/or exposure energy, although the effects of varying these parameters on geometric accuracy, mechanical strength, overall manufacturing time, and other variables were not explored.

Originality/value

This work systematically investigated 3D microstructure fabrication using different concentrations of a light absorber in solution, and demonstrated that different light absorption characteristics were required for different down‐facing micro‐features.

Keywords

Citation

Choi, J., Wicker, R.B., Cho, S., Ha, C. and Lee, S. (2009), "Cure depth control for complex 3D microstructure fabrication in dynamic mask projection microstereolithography", Rapid Prototyping Journal, Vol. 15 No. 1, pp. 59-70. https://doi.org/10.1108/13552540910925072

Publisher

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Emerald Group Publishing Limited

Copyright © 2009, Emerald Group Publishing Limited

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