Calculated Temperature Dependence of Mobility in Silicon Inversion Layers

Frank Stern
Phys. Rev. Lett. 44, 1469 – Published 2 June 1980
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Abstract

Calculations of the temperature dependence of mobility have been carried out for silicon (001) inversion layers in which Coulomb scattering and surface roughness scattering, but not phonon scattering, are included. The wave-vector and temperature dependence of screening contribute to a temperature-dependent part of the scattering rate that increases approximately linearly with temperature from 0 to 40 K. The results are supported by recent experiments of Cham and Wheeler.

  • Received 3 March 1980

DOI:https://doi.org/10.1103/PhysRevLett.44.1469

©1980 American Physical Society

Authors & Affiliations

Frank Stern

  • IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598

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Issue

Vol. 44, Iss. 22 — 2 June 1980

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