Abstract
Electron injection into thick Si films in Pt/Si/Si structures using ballistic electron emission microscopy (BEEM) is found to produce a local suppression in the BEEM current, which is at least partly due to electron trapping in the Si film. Measured variations in the BEEM threshold voltage with the voltage applied across the Si film can be used to estimate the local trapped electron density and the centroid location, which agree with macroscopic measurements. Our measurements indicate that BEEM can be sensitive to very small numbers of electrons trapped in buried Si films.
- Received 8 November 1995
DOI:https://doi.org/10.1103/PhysRevLett.77.91
©1996 American Physical Society