Structurally induced optical transitions in Ge-Si superlattices

T. P. Pearsall, J. Bevk, L. C. Feldman, J. M. Bonar, J. P. Mannaerts, and A. Ourmazd
Phys. Rev. Lett. 58, 729 – Published 16 February 1987; Erratum Phys. Rev. Lett. 58, 1053 (1987)
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Abstract

Using electroreflectance spectroscopy, we have observed new optical transitions near 0.76, 1.25, and 2.31 eV in an ordered strained-layer Ge-Si superlattice. The possible origins of these transitions are discussed in terms of modification of the electronic band structure by the sample structure.

  • Received 24 October 1986

DOI:https://doi.org/10.1103/PhysRevLett.58.729

©1987 American Physical Society

Erratum

Structurally Induced Optical Transitions in Ge-Si Superlattices

T. P. Pearsall, J. Bevk, L. C. Feldman, J. M. Bonar, J. P. Mannaerts, and A. Ourmazd
Phys. Rev. Lett. 58, 1053 (1987)

Authors & Affiliations

T. P. Pearsall, J. Bevk, L. C. Feldman, J. M. Bonar, and J. P. Mannaerts

  • AT&T Bell Laboratories, Murray Hill, New Jersey 07974

A. Ourmazd

  • AT&T Bell Laboratories, Holmdel, New Jersey 07733

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Issue

Vol. 58, Iss. 7 — 16 February 1987

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