Normal Photoelectron Diffraction of the Se 3d Level in Se Overlayers on Ni(100)

S. D. Kevan, D. H. Rosenblatt, D. Denley, B. -C. Lu, and D. A. Shirley
Phys. Rev. Lett. 41, 1565 – Published 27 November 1978
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Abstract

Modulations of up to a factor of 2 were observed in the Se 3d photoelectron intensity normal to the surface, for selenium overlayers on Ni(100), as the photon energy was varied from 90 to 240 eV. Excellent agreement of peak energies with predictions by Tong and Li was obtained for both the c(2×2) and p(2×2) structures, using the hollow-site geometry. Normal photoelectron diffraction appears to have promise as a surface structural method.

  • Received 18 September 1978

DOI:https://doi.org/10.1103/PhysRevLett.41.1565

©1978 American Physical Society

Authors & Affiliations

S. D. Kevan, D. H. Rosenblatt, D. Denley*, B. -C. Lu, and D. A. Shirley

  • Materials and Molecular Research Division, Lawrence Berkeley Laboratory, University of California, Berkeley, California 94720, and Department of Chemistry, University of California, Berkeley, California 94720

  • *Also with Department of Physics, University of California, Berkeley, Calif. 94720.

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Vol. 41, Iss. 22 — 27 November 1978

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