Generation of amorphous silicon structures by rapid quenching: A molecular-dynamics study

Manabu Ishimaru, Shinji Munetoh, and Teruaki Motooka
Phys. Rev. B 56, 15133 – Published 15 December 1997
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Abstract

Amorphous silicon (a-Si) networks have been generated from melted Si with various quenching rates by molecular-dynamics (MD) simulations employing the Tersoff potential. The cooling rates were set between 5×1011 and 1×1014K/s; the latter is the slowest quenching rate in MD simulations previously performed. Although the atomic configurations formed by the cooling rate of 1014K/s could reproduce the radial distribution function of a-Si obtained experimentally, they contained numerous structural defects such as threefold- and fivefold-coordinated atoms. As the cooling rate decreased, the average coordination number became 4 and tetrahedral bonds predominated. The structural and dynamical properties of a-Si generated by a cooling rate with 1012K/s were in excellent agreement with those of a-Si obtained experimentally.

  • Received 24 June 1997

DOI:https://doi.org/10.1103/PhysRevB.56.15133

©1997 American Physical Society

Authors & Affiliations

Manabu Ishimaru, Shinji Munetoh, and Teruaki Motooka

  • Department of Materials Science and Engineering, Kyushu University, Hakozaki, Fukuoka 812-81, Japan

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Issue

Vol. 56, Iss. 23 — 15 December 1997

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