Ferroelectric Diodes with Charge Injection and Trapping

Zhen Fan, Hua Fan, Zengxing Lu, Peilian Li, Zhifeng Huang, Guo Tian, Lin Yang, Junxiang Yao, Chao Chen, Deyang Chen, Zhibo Yan, Xubing Lu, Xingsen Gao, and Jun-Ming Liu
Phys. Rev. Applied 7, 014020 – Published 27 January 2017
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Abstract

Ferroelectric diodes with polarization-modulated Schottky barriers are promising for applications in resistive switching (RS) memories. However, they have not achieved satisfactory performance reliability as originally hoped. The physical origins underlying this issue have not been well studied, although they deserve much attention. Here, by means of scanning Kelvin probe microscopy we show that the electrical poling of ferroelectric diodes can cause significant charge injection and trapping besides polarization switching. We further show that the reproducibility and stability of switchable diode-type RS behavior are significantly affected by the interfacial traps. A theoretical model is then proposed to quantitatively describe the modifications of Schottky barriers by charge injection and trapping. This model is able to reproduce various types of hysteretic current-voltage characteristics as experimentally observed. It is further revealed that the charge injection and trapping can significantly modify the electroresistance ratio, RS polarity, and high- or low-resistance states initially defined by the polarization direction. Several approaches are suggested to suppress the effect of charge injection and trapping so as to realize high-performance polarization-reversal-induced RS. This study, therefore, reveals the microscopic mechanisms for the RS behavior comodulated by polarization reversal and charge trapping in ferroelectric diodes, and also provides useful suggestions for developing reliable ferroelectric RS memories.

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  • Received 8 September 2016

DOI:https://doi.org/10.1103/PhysRevApplied.7.014020

© 2017 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Zhen Fan1,*, Hua Fan1, Zengxing Lu2, Peilian Li1, Zhifeng Huang1, Guo Tian1, Lin Yang1, Junxiang Yao1, Chao Chen1, Deyang Chen1, Zhibo Yan2, Xubing Lu1, Xingsen Gao1,†, and Jun-Ming Liu1,2

  • 1Institute for Advanced Materials and Guangdong Provincial Key Laboratory of Quantum Engineering and Quantum Materials, South China Normal University, Guangzhou 510006, China
  • 2Laboratory of Solid State Microstructures and Innovation Center of Advanced Microstructures, Nanjing University, Nanjing 210093, China

  • *To whom all correspondence should be addressed. fanzhen@m.scnu.edu.cn
  • To whom all correspondence should be addressed. xingsengao@scnu.edu.cn

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Vol. 7, Iss. 1 — January 2017

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