Inorganic halogen ligands in quantum dots: I−, Br−, Cl− and film fabrication through electrophoretic deposition

Guangda Niu; Liduo Wang; Rui Gao; Wenzhe Li; Xudong Guo; Haopeng Dong; Yong Qiu

doi:10.1039/C3CP52678J

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Inorganic halogenligands in quantum dots: I⁻, Br⁻, Cl⁻ and film fabrication through electrophoretic deposition†

Guangda Niu,^a Liduo Wang,*^a Rui Gao,^a Wenzhe Li,^a Xudong Guo,^a Haopeng Dong^a and Yong Qiu^a

Author affiliations

* Corresponding authors

^a Key Lab of Organic Optoelectronics and Molecular Engineering of Ministry of Education, Department of Chemistry, Tsinghua University, Beijing, P. R. China
E-mail: chldwang@mail.tsinghua.edu.cn

Abstract

Halogen ions (I⁻, Br⁻, Cl⁻) were added into a colloidal solution of CdSe and PbS quantum dots (QDs) to form QDs capped with these inorganic ligands. Halogen ions attached to QDs through electrostatic interactions and the varying coordination strength between the inorganic ligands and QDs led to different degrees of redispersion and stabilization in polar solvents. Moreover, we successfully conducted electrophoretic deposition (EPD) of QDs capped with inorganic ligands. Negatively charged QDs were adsorbed onto a positively charged TiO₂ anode. The assembled QDs films were used in photovoltaic devices and offered better efficiency than QDs capped with organic ligands. This work demonstrates that halogen ions are indeed promising ligands to improve the stability of QDs with inorganic ligands and the EPD method shows prospects in assembling QDs films for practical applications.

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Article information

DOI: https://doi.org/10.1039/C3CP52678J
Article type: Paper
Submitted: 26 Jun 2013
Accepted: 31 Jul 2013
First published: 31 Jul 2013

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Phys. Chem. Chem. Phys., 2013,15, 19595-19600

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Inorganic halogen ligands in quantum dots: I⁻, Br⁻, Cl⁻ and film fabrication through electrophoretic deposition

G. Niu, L. Wang, R. Gao, W. Li, X. Guo, H. Dong and Y. Qiu, Phys. Chem. Chem. Phys., 2013, 15, 19595 DOI: 10.1039/C3CP52678J

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