Issue 9, 2010
From the journal:

Chemical Communications

Gas phase controlled deposition of high quality large-area graphene films†

Shishir Kumar,ab   Niall McEvoy,ac   Tarek Lutz,a   Gareth P. Keeley,ab   Valeria Nicolosi,d   Chris P. Murray,e   Werner J. Blauac  and  Georg S. Duesberg*ab  

* Corresponding authors

a Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Dublin 2, Ireland

b School of Chemistry, Trinity College Dublin, Dublin 2, Ireland

c School of Physics, Trinity College Dublin, Dublin 2, Ireland

d Department of Materials, University of Oxford, Parks Road, Oxford, UK

e Intel Ireland Limited, Collinstown Industrial Park, Leixlip, County Kildare, Ireland

Abstract

A gas phase controlled graphene synthesis resembling a CVD process that does not critically depend on cooling rates is reported. The controllable catalytic CVD permits high quality large-area graphene formation with deft control over the thickness from monolayers to thick graphitic structures at temperatures as low as 750 °C.

Graphical abstract: Gas phase controlled deposition of high quality large-area graphene films

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Article information

DOI
https://doi.org/10.1039/B919725G
Article type
Communication
Submitted
22 Sep 2009
Accepted
13 Jan 2010
First published
29 Jan 2010

Chem. Commun., 2010,46, 1422-1424

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Gas phase controlled deposition of high quality large-area graphene films

S. Kumar, N. McEvoy, T. Lutz, G. P. Keeley, V. Nicolosi, C. P. Murray, W. J. Blau and G. S. Duesberg, Chem. Commun., 2010, 46, 1422 DOI: 10.1039/B919725G

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