Issue 2, 2010
From the journal:

Physical Chemistry Chemical Physics

Adjustment of the bioresistivity by electron irradiation: self-assembled monolayers of oligo(ethyleneglycol)-terminated alkanethiols with embedded cleavable group†

Simone Krakert,a   Nirmalya Ballav,‡b   Michael Zharnikov*b  and  Andreas Terfort*c  

* Corresponding authors

a Philipps-Universität Marburg, Fachbereich Chemie, Hans-Meerwein-Strasse, 35032 Marburg, Germany

b Angewandte Physikalische Chemie, Universität Heidelberg, Im Neuenheimer Feld 253, 69120 Heidelberg, Germany
E-mail: Michael.Zharnikov@urz.uni-heidelberg.de
Fax: +49-6221-54 6199
Tel: +49-6221-54 4921

c Goethe-Universität Frankfurt am Main, Fachbereich Biochemie, Chemie und Pharmazie, Max-von-Laue-Strasse 9, 60438 Frankfurt am Main, Germany
E-mail: aterfort@chemie.uni-frankfurt.de
Fax: +49-69 798 29188
Tel: +49-69 798 29180

Abstract

The bioresistivity of protein-repelling films, such as e.g. oligoethyleneglycol (OEG) bearing self-assembled monolayers (SAMs), can be adjusted by electron irradiation. We have studied the effect of an embedded irradiation-sensitive functional group (so called “weak link”) on the irradiation sensitivity of such films. As test systems, we used two OEG-substituted alkanethiolate SAMs with different lengths of the OEG chain and a sulfone group serving as a “weak link” moiety; this group was embedded between the OEG and alkyl chains of the target molecules. The expected cleavage of the molecular chains at the predetermined “weak link” position was found to be accompanied by direct damage of the OEG matrix, with a dominance of the latter process in the case of a long OEG chain. At the same time, in the case of short OEG chain, the insertion of sulfone group resulted in a noticeable gain in the irradiation sensitivity of the respective SAMs and, consequently, in enhanced tunability of their protein-adhesive properties. These films, along with other OEG-substituted SAMs and polymer layers with and without an embedded weak link moiety, can be used as primary matrices for the fabrication of different protein patterns by electron beam lithography.

Graphical abstract: Adjustment of the bioresistivity by electron irradiation: self-assembled monolayers of oligo(ethyleneglycol)-terminated alkanethiols with embedded cleavable group

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Article information

DOI
https://doi.org/10.1039/B915036F
Article type
Paper
Submitted
23 Jul 2009
Accepted
20 Oct 2009
First published
16 Nov 2009

Phys. Chem. Chem. Phys., 2010,12, 507-515

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Adjustment of the bioresistivity by electron irradiation: self-assembled monolayers of oligo(ethyleneglycol)-terminated alkanethiols with embedded cleavable group

S. Krakert, N. Ballav, M. Zharnikov and A. Terfort, Phys. Chem. Chem. Phys., 2010, 12, 507 DOI: 10.1039/B915036F

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