Issue 58, 2015

Poly(dimethylsiloxane) (PDMS) surface patterning by biocompatible photo-crosslinking block copolymers

Abstract

Poly(2-methacryloyloxyethyl phosphorylcholine) (PMPC) possesses protein antifouling properties. Diblock copolymers (PMPC120-b-P(TSM/CEAx)y) composed of a PMPC block and random copolymer block with 3-(tris(trimethylsiloxy)silyl)propyl methacrylate (TSM) and 2-cinnamoylethyl acrylate (CEA) were prepared via reversible addition–fragmentation chain transfer (RAFT) radical polymerization. A thin film of PMPC120-P(TSM/CEAx)y formed on the surface of the poly(dimethylsiloxane) (PDMS) substrate due to physical adsorption of the TSM units to poly(dimethylsiloxane) (PDMS) and photo-crosslinking of the CEA units. A lattice pattern of PMPC120-P(TSM/CEAx)y on the PDMS surface was prepared using UV irradiation through a photomask. PMPC120-P(TSM/CEAx)y-coated PDMS demonstrated protein antifouling activity. Cell patterning could be achieved by culturing on the PMPC-patterned PDMS substrate.

Graphical abstract: Poly(dimethylsiloxane) (PDMS) surface patterning by biocompatible photo-crosslinking block copolymers

Supplementary files

Article information

Article type
Paper
Submitted
12 May 2015
Accepted
18 May 2015
First published
20 May 2015

RSC Adv., 2015,5, 46686-46693

Author version available

Poly(dimethylsiloxane) (PDMS) surface patterning by biocompatible photo-crosslinking block copolymers

K. Kuroda, H. Miyoshi, S. Fujii, T. Hirai, A. Takahara, A. Nakao, Y. Iwasaki, K. Morigaki, K. Ishihara and S. Yusa, RSC Adv., 2015, 5, 46686 DOI: 10.1039/C5RA08843G

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements