Issue 44, 2005
From the journal:

Journal of Materials Chemistry

Highly ordered CTAB-templated organosilicate films

Muriel Matheron,ad   Alexis Bourgeois,b   Aline Brunet-Bruneau,b   Pierre-Antoine Albouy,c   John Biteau,d   Thierry Gacoina  and  Jean-Pierre Boilot*a  

* Corresponding authors

a Groupe de Chimie du Solide, Laboratoire de Physique de la Matière Condensée, UMR CNRS 7643, Ecole Polytechnique, 91128 Palaiseau, France
E-mail: jean-pierre.boilot@polytechnique.fr
Fax: 33 (1) 69 33 30 04
Tel: 33(1) 69 33 46 51

b Laboratoire d'Optique des Solides, Université Paris 6, UMR CNRS 7601, Campus Boucicaut, 140 rue de Lourmel, case 80, 75015 Paris, France

c Laboratoire de Physique des Solides, Université Paris-Sud, 91405 Orsay Cedex, France

d Essilor International, Centre Technique de Saint-Maur, 57, avenue de Condé, 94106 Saint-Maur des Fossés, France

Abstract

Well-ordered organic–inorganic mesoporous films are prepared using an original two-step synthesis and compositions up to 50 mol% methyltriethoxysilane (MTES). These materials exhibit the three different mesostructures (2D-hexagonal, 3D-hexagonal and cubic) previously observed in the pure silica system with significant modifications of their domain of stability. During deposition and drying of organosilicate films, MTES monomers progressively condense at the internal surface of the silica clusters in agreement with the monomer–cluster growth model, leading to a significant reduction of the microporosity in the silica walls of the mesoporous structure.

Graphical abstract: Highly ordered CTAB-templated organosilicate films

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Article information

DOI
https://doi.org/10.1039/B510554D
Article type
Paper
Submitted
25 Jul 2005
Accepted
06 Sep 2005
First published
27 Sep 2005

J. Mater. Chem., 2005,15, 4741-4745

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Highly ordered CTAB-templated organosilicate films

M. Matheron, A. Bourgeois, A. Brunet-Bruneau, P. Albouy, J. Biteau, T. Gacoin and J. Boilot, J. Mater. Chem., 2005, 15, 4741 DOI: 10.1039/B510554D

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