Aberration-Corrected Electron Beam Lithography at the One Nanometer Length Scale

Manfrinato, Vitor R.; Stein, Aaron; Zhang, Lihua; Nam, Chang-Yong; Yager, Kevin G.; Stach, Eric A.; Black, Charles T.

doi:10.1021/acs.nanolett.7b00514

Title: Aberration-Corrected Electron Beam Lithography at the One Nanometer Length Scale

Journal Article · Tue Apr 18 00:00:00 EDT 2017 · Nano Letters

DOI:https://doi.org/10.1021/acs.nanolett.7b00514· OSTI ID:1425048

Manfrinato, Vitor R. ^[1]; Stein, Aaron ^[1]; Zhang, Lihua ^[1];

^[1]; Yager, Kevin G. ^[1];

^[1]; Black, Charles T. ^[1]

Brookhaven National Lab. (BNL), Upton, NY (United States)

Patterning materials efficiently at the smallest length scales has been a longstanding challenge in nanotechnology. Electron-beam lithography (EBL) is the primary method for patterning arbitrary features, but EBL has not reliably provided sub-4 nm patterns. The few competing techniques that have achieved this resolution are orders of magnitude slower than EBL. In this work, we employed an aberration-corrected scanning transmission electron microscope for lithography to achieve unprecedented resolution. Here we show aberration-corrected EBL at the one nanometer length scale using poly(methyl methacrylate) (PMMA) and have produced both the smallest isolated feature in any conventional resist (1.7 ± 0.5 nm) and the highest density patterns in PMMA (10.7 nm pitch for negative-tone and 17.5 nm pitch for positive-tone PMMA). We also demonstrate pattern transfer from the resist to semiconductor and metallic materials at the sub-5 nm scale. These results indicate that polymer-based nanofabrication can achieve feature sizes comparable to the Kuhn length of PMMA and ten times smaller than its radius of gyration. Use of aberration-corrected EBL will increase the resolution, speed, and complexity in nanomaterial fabrication.

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Research Organization:: Brookhaven National Laboratory (BNL), Upton, NY (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

Grant/Contract Number:: SC0012704

OSTI ID:: 1425048

Report Number(s):: BNL-114469-2017-JAAM; TRN: US1802014

Journal Information:: Nano Letters, Vol. 17, Issue 8; ISSN 1530-6984

Publisher:: American Chemical SocietyCopyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 70 works

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References (41)

One-Dimensional Nanostructures: Synthesis, Characterization, and Applications Xia, Y.; Yang, P.; Sun, Y. Advanced Materials, Vol. 15, Issue 5, p. 353-389 https://doi.org/10.1002/adma.200390087	journal	March 2003
Colloidal nanocrystal synthesis and the organic–inorganic interface Yin, Yadong; Alivisatos, A. Paul Nature, Vol. 437, Issue 7059, p. 664-670 https://doi.org/10.1038/nature04165	journal	September 2005
On-Wire Lithography Qin, L. Science, Vol. 309, Issue 5731 https://doi.org/10.1126/science.1112666	journal	July 2005
Resolution Limits of Electron-Beam Lithography toward the Atomic Scale Manfrinato, Vitor R.; Zhang, Lihua; Su, Dong Nano Letters, Vol. 13, Issue 4 https://doi.org/10.1021/nl304715p	journal	March 2013
I n s i t u vaporization of very low molecular weight resists using 1/2 nm diameter electron beams Isaacson, M.; Muray, A. Journal of Vacuum Science and Technology, Vol. 19, Issue 4 https://doi.org/10.1116/1.571180	journal	November 1981
Approaching the Resolution Limit of Nanometer-Scale Electron Beam-Induced Deposition van Dorp, Willem F.; van Someren, Bob; Hagen, Cornelis W. Nano Letters, Vol. 5, Issue 7 https://doi.org/10.1021/nl050522i	journal	July 2005
A single-atom transistor Fuechsle, Martin; Miwa, Jill A.; Mahapatra, Suddhasatta Nature Nanotechnology, Vol. 7, Issue 4 https://doi.org/10.1038/nnano.2012.21	journal	February 2012
Atomic precision lithography on Si Randall, J. N.; Lyding, J. W.; Schmucker, S. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 27, Issue 6 https://doi.org/10.1116/1.3237096	journal	January 2009
Direct and Reliable Patterning of Plasmonic Nanostructures with Sub-10-nm Gaps Duan, Huigao; Hu, Hailong; Kumar, Karthik ACS Nano, Vol. 5, Issue 9 https://doi.org/10.1021/nn2025868	journal	August 2011
Fabrication of high-density nanostructures by electron beam lithography Dial, O. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 16, Issue 6 https://doi.org/10.1116/1.590428	journal	November 1998
Enhanced resolution of poly(methyl methacrylate) electron resist by thermal processing Arjmandi, Nima; Lagae, Liesbet; Borghs, Gustaaf Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 27, Issue 4 https://doi.org/10.1116/1.3167367	journal	January 2009
Sub-10-nm half-pitch electron-beam lithography by using poly(methyl methacrylate) as a negative resist Duan, Huigao; Winston, Donald; Yang, Joel K. W. Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 28, Issue 6 https://doi.org/10.1116/1.3501353	journal	November 2010
Challenges in 1 Teradot∕in.[sup 2] dot patterning using electron beam lithography for bit-patterned media Yang, XiaoMin; Xiao, Shuaigang; Wu, Wei Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 25, Issue 6 https://doi.org/10.1116/1.2798711	journal	January 2007
Ultrahigh resolution of calixarene negative resist in electron beam lithography Fujita, J.; Ohnishi, Y.; Ochiai, Y. Applied Physics Letters, Vol. 68, Issue 9 https://doi.org/10.1063/1.115958	journal	February 1996
Metrology for electron-beam lithography and resist contrast at the sub-10 nm scale Duan, Huigao; Manfrinato, Vitor R.; Yang, Joel K. W. Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 28, Issue 6 https://doi.org/10.1116/1.3501359	journal	November 2010
Nano-patterning of a hydrogen silsesquioxane resist with reduced linewidth fluctuations Namatsu, H.; Yamaguchi, T.; Nagase, M. Microelectronic Engineering, Vol. 41-42 https://doi.org/10.1016/S0167-9317(98)00076-8	journal	March 1998
Molecular Glass Resists as High-Resolution Patterning Materials De Silva, Anuja; Felix, Nelson M.; Ober, Christopher K. Advanced Materials, Vol. 20, Issue 17 https://doi.org/10.1002/adma.200800763	journal	September 2008
Imaging single atoms using secondary electrons with an aberration-corrected electron microscope Zhu, Y.; Inada, H.; Nakamura, K. Nature Materials, Vol. 8, Issue 10 https://doi.org/10.1038/nmat2532	journal	September 2009
Fire up the atom forge Kalinin, Sergei V.; Borisevich, Albina; Jesse, Stephen Nature, Vol. 539, Issue 7630 https://doi.org/10.1038/539485a	journal	November 2016
Mechanisms of radiation damage in beam-sensitive specimens, for TEM accelerating voltages between 10 and 300 kV Egerton, R. F. Microscopy Research and Technique, Vol. 75, Issue 11 https://doi.org/10.1002/jemt.22099	journal	July 2012
Robust Pattern Transfer of Nanoimprinted Features for Sub-5-nm Fabrication Schvartzman, Mark; Wind, Shalom J. Nano Letters, Vol. 9, Issue 10 https://doi.org/10.1021/nl9018512	journal	October 2009
Reliable fabrication of 3 nm gaps between nanoelectrodes by electron-beam lithography Manheller, Marcel; Trellenkamp, Stefan; Waser, Rainer Nanotechnology, Vol. 23, Issue 12 https://doi.org/10.1088/0957-4484/23/12/125302	journal	March 2012
Single-molecule transistors Perrin, Mickael L.; Burzurí, Enrique; van der Zant, Herre S. J. Chemical Society Reviews, Vol. 44, Issue 4 https://doi.org/10.1039/C4CS00231H	journal	January 2015
Fabrication of sub-10-nm Au–Pd structures using 30 keV electron beam lithography and lift-off Lehmann, F.; Richter, G.; Borzenko, T. Microelectronic Engineering, Vol. 65, Issue 3 https://doi.org/10.1016/S0167-9317(02)00963-2	journal	March 2003
Large area arrays of metal nanowires Auzelyte, V.; Solak, H. H.; Ekinci, Y. Microelectronic Engineering, Vol. 85, Issue 5-6 https://doi.org/10.1016/j.mee.2008.01.064	journal	May 2008
Chemically Enhancing Block Copolymers for Block-Selective Synthesis of Self-Assembled Metal Oxide Nanostructures Kamcev, Jovan; Germack, David S.; Nykypanchuk, Dmytro ACS Nano, Vol. 7, Issue 1 https://doi.org/10.1021/nn304122b	journal	December 2012
Sub-10 nm High-Aspect-Ratio Patterning of ZnO Using an Electron Beam Saifullah, M. S. M.; Subramanian, K. R. V.; Kang, D. -J. Advanced Materials, Vol. 17, Issue 14 https://doi.org/10.1002/adma.200500484	journal	July 2005
Enhanced Lithographic Imaging Layer Meets Semiconductor Manufacturing Specification a Decade Early Tseng, Yu-Chih; Mane, Anil U.; Elam, Jeffrey W. Advanced Materials, Vol. 24, Issue 19, p. 2608-2613 https://doi.org/10.1002/adma.201104871	journal	April 2012
Transmission Electron Microscopy Williams, David B.; Carter, C. Barry https://doi.org/10.1007/978-0-387-76501-3	book	January 2009
Determining the Resolution Limits of Electron-Beam Lithography: Direct Measurement of the Point-Spread Function Manfrinato, Vitor R.; Wen, Jianguo; Zhang, Lihua Nano Letters, Vol. 14, Issue 8 https://doi.org/10.1021/nl5013773	journal	June 2014
Polymeric Electron Beam Resists Ku, H. Y.; Scala, L. C. Journal of The Electrochemical Society, Vol. 116, Issue 7 https://doi.org/10.1149/1.2412194	journal	January 1969
Optimal temperature for development of poly(methylmethacrylate) Cord, Bryan; Lutkenhaus, Jodie; Berggren, Karl K. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 25, Issue 6 https://doi.org/10.1116/1.2799978	journal	January 2007
Using high-contrast salty development of hydrogen silsesquioxane for sub-10-nm half-pitch lithography Yang, Joel K. W.; Berggren, Karl K. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 25, Issue 6 https://doi.org/10.1116/1.2801881	journal	January 2007
Quantum plasmonics Tame, M. S.; McEnery, K. R.; Özdemir, Ş. K. Nature Physics, Vol. 9, Issue 6 https://doi.org/10.1038/nphys2615	journal	June 2013
Nonlocal Response of Metallic Nanospheres Probed by Light, Electrons, and Atoms Christensen, Thomas; Yan, Wei; Raza, Søren ACS Nano, Vol. 8, Issue 2 https://doi.org/10.1021/nn406153k	journal	January 2014
Quantum mechanical effects in plasmonic structures with subnanometre gaps Zhu, Wenqi; Esteban, Ruben; Borisov, Andrei G. Nature Communications, Vol. 7, Issue 1 https://doi.org/10.1038/ncomms11495	journal	June 2016
High-Energy Surface and Volume Plasmons in Nanopatterned Sub-10 nm Aluminum Nanostructures Hobbs, Richard G.; Manfrinato, Vitor R.; Yang, Yujia Nano Letters, Vol. 16, Issue 7 https://doi.org/10.1021/acs.nanolett.6b01012	journal	June 2016
Sub-100-nm Sized Silver Split Ring Resonator Metamaterials with Fundamental Magnetic Resonance in the Middle Visible Spectrum Tobing, Landobasa Y. M.; Tjahjana, Liliana; Zhang, Dao Hua Advanced Optical Materials, Vol. 2, Issue 3 https://doi.org/10.1002/adom.201300456	journal	January 2014
Phonon wave interference and thermal bandgap materials Maldovan, Martin Nature Materials, Vol. 14, Issue 7 https://doi.org/10.1038/nmat4308	journal	June 2015
Reading and writing single-atom magnets Natterer, Fabian D.; Yang, Kai; Paul, William Nature, Vol. 543, Issue 7644 https://doi.org/10.1038/nature21371	journal	March 2017
MoS2 transistors with 1-nanometer gate lengths Desai, S. B.; Madhvapathy, S. R.; Sachid, A. B. Science, Vol. 354, Issue 6308 https://doi.org/10.1126/science.aah4698	journal	October 2016

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