Applications of Photocurable PMMS Thiol–Ene Stamps in Soft Lithography

Campos, Luis M.; Truong, Tu T.; Shim, Dong Eun; Dimitriou, Michael D.; Shir, Daniel; Meinel, Ines; Gerbec, Jeffrey A.; Hahn, H. Thomas; Rogers, John A.; Hawker, Craig J.

doi:10.1021/cm902506a

Title: Applications of Photocurable PMMS Thiol–Ene Stamps in Soft Lithography

Journal Article · Wed Oct 14 00:00:00 EDT 2009 · Chemistry of Materials

DOI:https://doi.org/10.1021/cm902506a· OSTI ID:1875074

Campos, Luis M. ^[1]; Truong, Tu T. ^[2]; Shim, Dong Eun ^[3]; Dimitriou, Michael D. ^[1]; Shir, Daniel ^[2]; Meinel, Ines ^[4]; Gerbec, Jeffrey A. ^[4]; Hahn, H. Thomas ^[3]; Rogers, John A. ^[2]; Hawker, Craig J. ^[1]

Univ. of California, Santa Barbara, CA (United States)
Univ. of Illinois at Urbana-Champaign, IL (United States)
Univ. of California, Los Angeles, CA (United States)
MC Research and Innovation Center, Goleta, CA (United States)

We report the performance and characterization of a material based on poly[(3-mercaptopropyl)methylsiloxane] (PMMS) in various soft lithography applications. PMMS stamps were made by cross-linking with triallyl cyanurate and ethoxylated (4) bisphenol A dimethacrylate via thiol–ene mixed-mode chemistry. The surface chemistry of the materials was characterized by XPS when varied from hydrophilic through oxygen plasma treatment, to hydrophobic by exposure to a fluorinated trichlorosilane agent. Furthermore, the materials are transparent above 300 nm and thermally stable up to 225 °C, thus rendering them capable to be employed in step-and-flash imprint lithography, nanoimprint lithography, nanotransfer printing, and proximity-field nanopatterning. The successful pattern replication from the micrometer to sub-100 nm scale was demonstrated.

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Research Organization:: Univ. of Illinois at Urbana-Champaign, IL (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division; National Science Foundation (NSF)

Grant/Contract Number:: FG02-07ER46471; FG02-07ER46453; CHE-0514031; DMR-0520415

OSTI ID:: 1875074

Journal Information:: Chemistry of Materials, Vol. 21, Issue 21; ISSN 0897-4756

Publisher:: American Chemical Society (ACS)Copyright Statement

Country of Publication:: United States

Language:: English

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Synthesis and nanoimprinting of high refractive index and highly transparent polythioethers based on thiol‐ene click chemistry Nakabayashi, Kazuhiro; Sobu, Shigeki; Kosuge, Yuji Journal of Polymer Science Part A: Polymer Chemistry, Vol. 56, Issue 19 https://doi.org/10.1002/pola.29181	journal	September 2018
Precursor strategies for metallic nano- and micropatterns using soft lithography Wisser, F. M.; Schumm, B.; Mondin, G. Journal of Materials Chemistry C, Vol. 3, Issue 12 https://doi.org/10.1039/c4tc02418d	journal	January 2015
Nonstick, Modulus-Tunable and Gas-Permeable Replicas for Mold-Based, High-Resolution Nanolithography Lee, Bong Kuk; Cho, Hyunmin; Chung, Bong Hyun Advanced Functional Materials, Vol. 21, Issue 19 https://doi.org/10.1002/adfm.201101278	journal	August 2011
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Photochemically Driven Polymeric Network Formation: Synthesis and Applications Blasco, Eva; Wegener, Martin; Barner-Kowollik, Christopher Advanced Materials, Vol. 29, Issue 15 https://doi.org/10.1002/adma.201604005	journal	January 2017
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