The deposition of TiO 2 thin films on self-assembly monolayers studied by X-ray photoelectron spectroscopy
References (23)
- et al.
Sol. Energy Mater.
(1981) Mater. Sci. Eng. B
(1992)- et al.
Surf. Sci.
(1995) - et al.
Appl. Surf. Sci.
(1993) - et al.
J. Mater. Sci.
(1980) - et al.
Appl. Opt.
(1979) - et al.
Appl. Environ. Microbiol.
(1988) - et al.
- et al.
J. Vac. Sci. Technol. A
(1983) - et al.
Science
(1994)
J. Mater. Res.
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2009, Applied Surface ScienceCitation Excerpt :The thiol-containing surface was placed in a 50-mL PTFE beaker containing a solution of 30% H2O2/HOAc (1:5, v/v) maintained at 45 °C. The substrate was withdrawn after 1 h and cleaned with DI water, acetone, and dried by N2 [24,25]. Copper film deposition experiments were carried out in a homemade CVD system that has been described previously [17,18].
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2007, Thin Solid FilmsPreparation and characterization of lanthanum-based thin films on sulfonated self-assembled monolayer of 3-mercaptopropyl trimethoxysilane
2006, Thin Solid FilmsCitation Excerpt :Usually, the terminal functionality can be chemically or photochemically modified to significantly alter the monolayer's chemical composition, reactivity and physical characteristics. Ordered molecular arrangements can be achieved by SAM adsorption even on solid surfaces of random atomic arrangements such as glasses, which provides a great potential for controlled inorganic crystal growth [4,16]. This simple process makes SAMs manufacturable and thus attractive for engineering applications.