On the formation and structure of self-assembling monolayers: III. Time of formation, solvent retention, and release
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Self-assembled monolayer-based nanoscaled surfaces
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2015, Materials Science and Engineering CCitation Excerpt :Alkylsilane SAMs have been widely studied on silicon and silicon dioxide surfaces due to the potential to serve a lot of applications in the semiconductor industry [20,162,201,218–223]. Alkylsilane SAMs have also been formed on many other substrates like H-terminated silicon [224], silicon nitride [225], aluminum oxide [226,227], aluminum alloy [228], tantalum pentoxide [209], coppper [229], titanium [216], titania [216], quartz [230–232], glass [233], mica [198,234], zinc selenide [226,233], nickel [216], chromium [216], iron [216], steel [235], carbon [236], niobium [216], zirconium [216], zirconium dioxide [213], hafnium dioxide [213], germanium oxide [233], indium tin oxide (ITO) [237], gallium nitride [238], gold [239,240], cobalt chromium [241], etc. Bradshaw et al. have carried out chemisorption studies of methylsilane on nickel, rhodium, tungsten and molybdenum [216,242,243].
Effects of surface water on organosilane nanostructure fabrication using particle lithography
2015, Thin Solid FilmsCitation Excerpt :Self-assembled monolayers (SAMs) of organosilanes have been employed as versatile molecular architectures for electronic, optical, and sensing platforms [1–4]. Among the reasons for interest in these SAMs are the rich chemical functionalities and range of substrates (Si, glass, mica, Au, etc.) that can be utilized to produce novel surfaces with well-defined properties [5–12]. Further, organosilane SAMs are thermally and chemically robust due to the covalent bonds formed between the organosilane molecules and underlying substrates.
Surface Functionalization of Biomaterials
2015, Stem Cell Biology and Tissue Engineering in Dental SciencesConstruction of octadecyltrichlorosilane self-assembled monolayer on stainless steel 316L surface
2014, Colloids and Surfaces A: Physicochemical and Engineering AspectsCitation Excerpt :If the hydrochloric acid on substrate surface could be removed, the corrosion on SS316L surface would not occur, and formation of the solid OTS SAM on SS316L substrate surface might be possible. Toluene was regard as the most suitable solvent to prepare the reaction solution for the formation of OTS SAM [22,23]. Although the normally used toluene is anhydrous, there is still trace water existed in the solvent.
Role of Sn(II) in Mediating the Formation and Organization of a Langmuir Monolayer
2023, Journal of Physical Chemistry B