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Effect of external electric field on morphology of copper phthalocyanine-fullerene blended films during annealing

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Abstract

The thin-film morphology and segregated phases of constituents in blends of organic semiconductors play an important role in determining the performance of devices fabricated with these constituents. In this study, we explored the effect of an external electric field applied during annealing on the morphology and phase of blended films of two popular organic semiconductors, copper pthalocyanine (CuPc) and buckminsterfullerene (C60). Films of different blend ratios annealed at various temperatures in both the presence and absence of an electric field were characterized using scanning electron microscopy (SEM), X-ray diffraction (XRD), and ultraviolet-visible (UV-vis) spectroscopy. The characteristics of annealed pristine CuPc films were also included for comparison. The observed changes in the properties of the blended films following the annealing, including the abrupt phase segregation of the blended constituents in the films, are discussed. The polarizability of the molecules was calculated using density functional theory (DFT) to explain the interaction, stacking, and segregation of the molecules in the blend. The results showed that application of an electric field during annealing of the blended films is an additional control parameter that can help tune the properties of the blended film.

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Authors and Affiliations

  1. Department of Physics and Samtel Centre for Display Technologies, Indian Institute of Technology Kanpur, Kanpur, 208016, Uttar Pradesh, India

    Anukul Prasad Parhi

  2. Department of Electrical Engineering and Samtel Centre for Display Technologies, Indian Institute of Technology Kanpur, Kanpur, 208016, Uttar Pradesh, India

    S. Sundar Kumar Iyer

Authors
  1. Anukul Prasad Parhi
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  2. S. Sundar Kumar Iyer
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Correspondence to S. Sundar Kumar Iyer.

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Parhi, A.P., Iyer, S.S.K. Effect of external electric field on morphology of copper phthalocyanine-fullerene blended films during annealing. Electron. Mater. Lett. 12, 260–269 (2016). https://doi.org/10.1007/s13391-015-5246-z

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  • DOI: https://doi.org/10.1007/s13391-015-5246-z

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