Abstract
Fused silica plates have been implanted with 40 keV Co+ or Ni+ ions to high doses in the range of (0.25–1.0) × 1017 ions/cm2, and magnetic properties of the implanted samples have been studied with ferromagnetic resonance (FMR) technique supplemented by transmission electron microscopy, electron diffraction and energy dispersive X-ray spectroscopy. The high-dose implantation with 3d-ions results in the formation of cobalt and nickel metal nanoparticles in the irradiated subsurface layer of the SiO2 matrix. Co and Ni nanocrystals with hexagonal close packing and face-centered cubic structures have a spherical shape and the sizes of 4–5 nm (for cobalt) and 6–14 nm (for nickel) in diameter. Room-temperature FMR signals from ensembles of Co and Ni nanoparticles implanted in the SiO2 matrix exhibit an out-of-plane uniaxial magnetic anisotropy that is typical for thin magnetic films. The dose and temperature dependences of FMR spectra have been analyzed using the Kittel formalism, and the effective magnetization and g-factor values have been obtained for Co- and Ni-implanted samples. Nonsymmetric FMR line shapes have been fitted by a sum of two symmetrical curves. The dependences of the magnetic parameters of each curve on the implantation dose and temperature are presented.
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Acknowledgments
The work was supported in part by the Russian Foundation for Basic Research, grant no. 11-02-00972-а, Ministry of Education and Science of the Russian Federation, Federal Target Program “Scientific and scientific-pedagogical personnel of innovative Russia”, contract no. 02.740.11.0797, and State Program “Development of the Scientific Potential of the Higher Education School”, project no. 2.1.1/6038. S.M. Zharkov acknowledges the financial support of the Russian government contract no. 02.740.11.0568. The electron microscopy investigations were carried out at the Joint Center of the Siberian Federal University.
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Edelman, I.S., Petrakovskaja, E.A., Petrov, D.A. et al. FMR and TEM Studies of Co and Ni Nanoparticles Implanted in the SiO2 Matrix. Appl Magn Reson 40, 363–375 (2011). https://doi.org/10.1007/s00723-011-0218-4
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DOI: https://doi.org/10.1007/s00723-011-0218-4