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Correlation of plume dynamics and oxygen pressure with VO2 stoichiometry during pulsed laser deposition

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Abstract

Vanadium dioxide thin films have been deposited on Corning glass substrates by a KrF laser ablation of V2O5 target at the laser fluence of 2 J cm−2. The substrate temperature and the target-substrate distance were set to 500 ∘C and 4 cm, respectively. X-ray diffraction analysis showed that pure VO2 is only obtained at an oxygen pressure range of 4×10−3–2×10−2 mbar. A higher optical switching contrast was obtained for the VO2 films deposited at 4×10−3–10−2 mbar. The films properties were correlated to the plume-oxygen gas interaction monitored by fast imaging of the plume.

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Authors and Affiliations

  1. Centre de Développement des Technologies Avancées, cité du 20 août 1956, B. P. 17, Baba Hassen, Algiers, Algeria

    S. Lafane, T. Kerdja, S. Abdelli-Messaci & Y. Khereddine

  2. Université des Sciences et Technologies Houari Boumediene—Faculté de Physique, BP 32 EL ALIA 16111 Bab Ezzouar, Alger, Algérie

    M. Kechouane

  3. Department of Physics and Engineering, University of Zululand, Private Bag X1001, 3886, Kwadlagezwa, South Africa

    O. Nemraoui

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  1. S. Lafane
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  2. T. Kerdja
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  3. S. Abdelli-Messaci
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Correspondence to S. Lafane.

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Lafane, S., Kerdja, T., Abdelli-Messaci, S. et al. Correlation of plume dynamics and oxygen pressure with VO2 stoichiometry during pulsed laser deposition. Appl. Phys. A 112, 159–164 (2013). https://doi.org/10.1007/s00339-012-7223-9

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  • DOI: https://doi.org/10.1007/s00339-012-7223-9

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