Skip to main content

Dynamic Secondary Ion Mass Spectrometry

  • Chapter
  • First Online:
Compendium of Surface and Interface Analysis
  • 462 Accesses

Abstract

Ion beam bombardment with energy of less than a few tens of kiloelectron volts (primary ion bombardment) onto the sample surface causes sputtering phenomena following cascade mixing in the near-surface of the sample.

This is a preview of subscription content, log in via an institution to check access.

Access this chapter

Institutional subscriptions

References

  1. Wittmaack, K.: Artifacts in low-energy depth profiling using oxygen primary ion beams: dependence on impact angle and oxygen flooding conditions. J. Vac. Sci. Technol., B 16, 2776–2785 (1998)

    Article  CAS  Google Scholar 

  2. Jiang, Z.X., Lerma, J., Sieloff, D., Lee, J.J., Backer, S., Bagchi, S., Conner, J.: Ultrahigh resolution secondary ion mass spectrometry profiling with oblique O2+ beams below 200 eV. J. Vac. Sci. Technol., B 22, 630–635 (2004)

    Article  CAS  Google Scholar 

  3. Surface chemical analysis—secondary-ion mass spectrometry—method for depth calibration for silicon using multiple delta-layer reference materials. ISO 23812 (2009)

    Google Scholar 

  4. Tomita, M., Hongo, C., Suzuki, M., Takenaka, M., Murakoshi, A.: Ultra-shallow depth profiling with secondary ion mass spectrometry. J. Vac. Sci. Technol., B 22, 317–322 (2004)

    Article  CAS  Google Scholar 

  5. Surface chemical analysis—secondary-ion mass spectrometry—determination of relative sensitivity factors from ion-implanted reference materials. ISO 18114 (2003)

    Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to Mitsuhiro Tomita .

Editor information

Editors and Affiliations

Rights and permissions

Reprints and permissions

Copyright information

© 2018 Springer Nature Singapore Pte Ltd.

About this chapter

Check for updates. Verify currency and authenticity via CrossMark

Cite this chapter

Tomita, M. (2018). Dynamic Secondary Ion Mass Spectrometry. In: The Surface Science Society of Japan (eds) Compendium of Surface and Interface Analysis. Springer, Singapore. https://doi.org/10.1007/978-981-10-6156-1_11

Download citation

Publish with us

Policies and ethics