Abstract
Surface plasmonic polaritons (SPPs)-based photo-nanolithography is a recently developed photolithography technology, capable of making breaking diffraction-limit deep-subwavelength patterns with compatible infrastructure instrumentations, materials, and processing with those used in the conventional photolithography technology. The physics origin of the superior capability of the SPPs-based photolithography is based on the unique properties of “optical frequency, but X-ray wavelength” of the surface evanescent waves induced at the interface of a metal and a dielectric material. This chapter reviews progress of different major implementation schemes of the SPPs-based photolithography in recent years, which include categories of prism-coupled SPPs nanolithography, grating-coupled SPPs nanolithography, superlens imaging nanolithography, SPPs direct writing nanolithography, and so on. The SPPs-based photolithography is currently a fast-growing research area in which new ideas and improvements about the technology continue to emerge. It is believed that it will have significant potential in the next-generation photolithography technology of nano features, large area, fast speed, and cost-effective.
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Liu, Q., Duan, X., Peng, C. (2014). Super-Resolution Patterning and Photolithography Based on Surface Plasmon Polaritons. In: Novel Optical Technologies for Nanofabrication. Nanostructure Science and Technology. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-40387-3_6
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DOI: https://doi.org/10.1007/978-3-642-40387-3_6
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