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Limits of Conventional Lithography

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Nanotechnology

Abstract

Lithography is a key element in a cadre of planar processing methods used in advanced semiconductor manufacturing. Technology sectors, such as integrated circuits, flat panel displays, optoelectronic components, and advanced electronic packaging, all especially rely on it. Lithography as discussed in this chapter is used to pattern layered materials and is akin to the photographic process. In photography an imaging system is used to record an image in a silver-containing emulsion. In conventional lithography the emulsion is replaced by a thin radiation sensitive layer, usually a polymer, known as a resist. A pattern of radiation exposes the resist in order to alter its solubility in a chemical developer. The process relies on the highly non-linear response of the resist to produce well defined patterns after development.

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Author information

Authors and Affiliations

  1. Bell Laboratories, Holmdel, NJ, 07733, USA

    D. M. Tennant

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  1. D. M. Tennant
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Editors and Affiliations

  1. Bell Laboratories, Lucent Technologies, Murray Hill, NJ, 07974-0636, USA

    Gregory Timp

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Tennant, D.M. (1999). Limits of Conventional Lithography. In: Timp, G. (eds) Nanotechnology. Springer, New York, NY. https://doi.org/10.1007/978-1-4612-0531-9_4

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  • DOI: https://doi.org/10.1007/978-1-4612-0531-9_4

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